Papers

With Tag: Reactive Ion Etching

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An integrated fully-differential CMOS-MEMS z-axis accelerometer utilizing a torsional suspension

Hongwei Qu, Deyou Fang, Huikai Xie
2008 | 10.1109/NEMS.2008.4484502

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Compact polarization-insensitive biopolymer multimode interference waveguide splitter

Jun Zhou, Z Y Wang, E Y B Pun
Applied Physics Letters | 2009 | 10.1063/1.3271680

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High temperature operation of GaInAsN laserdiodes in the 1.3 /spl mu/m regime

Michael Reinhardt, A Forchel, M Fischer
2000 | 10.1109/DRC.2000.877114

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Etch process development for FLARE TM for dual damascene architecture using a N 2 /O 2 plasma

1999 | 10.1109/IITC.1999.787078

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Factors controlling the etching rate and etching profile in the O2 reactive ion etching pattern transfer step in multilevel lithography

Polymer Engineering and Science | 1989 | 10.1002/pen.760291310

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Z-axis Capacitive Accelerometer with novel beams using SOG Structure

Yumin Lin, Mingxue Huo, Weiping Chen, Xiaowei Liu, Hongshi Li
2006 | 10.1109/NEMS.2006.334841

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Effect of MeV O 2+ implantation on the reactive ion etch rate of LiTaO 3

Nuclear Instruments & Methods in Physics Research Section B-beam Interactions With Materials and Atoms | 1999 | 10.1016/S0168-583X(99)00578-9

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Volatile products and endpoint detection in reactive ion etching of III–V compounds with a broad beam ECR source

Nuclear Instruments & Methods in Physics Research Section B-beam Interactions With Materials and Atoms | 1996 | 10.1016/B978-0-444-82334-2.50038-1

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Fabrication of regular mesoscopic networks of GaAs wires

I M Grigorieva, I B Butylina, Vladimir Samuilov, V K Ksenevich, L V Govor, I A Bashmakov, L V Solovjova
Superlattices and Microstructures | 1999 | 10.1006/spmi.1998.0624

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Magnetization reversal of CrO2 nanomagnet arrays

Atul Gupta, G X Miao, Qiang Zhang, Guozhi Xiao, Yi Li, A V Nurmikko
Journal of Applied Physics | 2004 | 10.1063/1.1812816

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Anneal-Less Domain Wall Displacement Detection of 27 Gbit/in2 Land/Groove Recording Using a Deep Groove Substrate and a Blue Laser

Japanese Journal of Applied Physics | 2005

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Anomalous High Rate Reactive Ion Etching Process for Indium Tin Oxide.

Japanese Journal of Applied Physics | 1997 | 10.1143/JJAP.36.L629

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Mechanism of silicon surface roughening by reactive ion etching

Surface and Interface Analysis | 1986 | 10.1002/sia.740080604

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Sub-55 nm Etch Process Using Stacked-Mask Process

Japanese Journal of Applied Physics | 2007 | 10.1143/JJAP.46.4286

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Coulomb Blockade Effects in a Highly Doped Silicon Quantum Wire Fabricated on Novel Molecular Beam Epitaxy Grown Material.

Japanese Journal of Applied Physics | 1999

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Alkali-Developable Silicone-Based Negative Photoresist (SNP) for Deep UV, Electron Beam, and X-Ray Lithographies

Japanese Journal of Applied Physics | 1989

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Electrical Evaluation of Sidewall Damage Caused by CH_4/H_2 Reactive Ion Etching

Japanese Journal of Applied Physics | 1998

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Fabrication of ZnTe Nanohole Arrays by Reactive Ion Etching Using Anodic Alumina Templates : Semiconductors

Japanese Journal of Applied Physics | 2002

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Binary optics for optical interconnects

1994 | 10.1117/12.177332

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Development of NbN Terahertz, HEB Mixer Devices and Films

A K Bhupathiraju, Xin Zhao, John Nicholson, Dazhen Gu, Eyal Gerecht, Fernando Rodriguez Morales, Sigfrid K Yngvesson, R Zannoni, Yan Zhuang

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