Papers

With Tag: Etching

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Surface micro-machined polysilicon probes for neurophysiology

Jit Muthuswamy, J D Mcbrayer, Nitish V Thakor, Murat Okandan
2000 | 10.1109/IEMBS.2000.900722

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An integrated fully-differential CMOS-MEMS z-axis accelerometer utilizing a torsional suspension

Hongwei Qu, Deyou Fang, Huikai Xie
2008 | 10.1109/NEMS.2008.4484502

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Equipment modeling for plasma etch process using artificial neural network

Arit Thammano
1998 | 10.1109/APCCAS.1998.743907

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Enhancement of colored engravings

Vladimir Misic, Robert R Buckley, Kevin J Parker
2002 | 10.1109/ICME.2002.1035885

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Electrical characteristics of silicon nanowire transistor fabricated by AFM lithography

Sabar D Hutagalung, Kam C Lew
2010 | 10.1109/SMELEC.2010.5549507

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Application of sodium hydroxide in analysis of gate oxide issue of leakage failures

K F Lo, A Oo, Z G Song, S P Neo, C K Oh
2004 | 10.1109/SMELEC.2004.1620871

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Effects of oxygen content, backside damage and polysilicon backsealed substrate on switching transistors and diodes

Amir Raslan Yahya, Jina Schumate, Herngder Chiou
1996 | 10.1109/SMELEC.1996.616463

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Deposition and etching of diaphragm and sacrificial layer in novel MEMS capacitive microphone structure

Bahram Azizollah Ganji, Burhanuddin Yeop Majlis
2008 | 10.1109/SMELEC.2008.4770314

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Characterization of etched tracks and nanotubules by ion transmission spectrometry

D Fink, A S Berdinsky, N Stolterfoht, L T Chadderton, V Hnatowicz, Jiri Vacik, A Petrov, M Muller, J Cervena
2002 | 10.1109/SREDM.2002.1024302

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Compact polarization-insensitive biopolymer multimode interference waveguide splitter

Jun Zhou, Z Y Wang, E Y B Pun
Applied Physics Letters | 2009 | 10.1063/1.3271680

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Influence of process pressure on the growth of hydrocarbon films under direct dc bias in an electron cyclotron resonance plasma

Qichun Zhang, Rusli, H Yang, Wei L New, S F Yoon, Jinho Ahn, Yi Sun Wu
Journal of Applied Physics | 1998 | 10.1063/1.368815

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On the constant composition and thickness of the chlorinated silicon surface layer subjected to increasing etching product concentrations during chlorine plasma etching

K H A Bogart, Vincent M Donnelly
Journal of Applied Physics | 1999 | 10.1063/1.370975

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Surface-micromachined chain for use in microelectromechanical structures

Vernon Sr George E
2001

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Josephson properties of Nb3Ge/oxide/Pb tunnel junctions

Osamu Michikami, Hajime Asano, Keiichi Tanabe
Applied Physics Letters | 1984 | 10.1063/1.94802

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Fabrication of a novel polysilicon lateral field emission triode with a high current density and high-transconductance

Dong Il Park, Sungho Hahm, Junghee Lee
1998 | 10.1109/IVMC.1998.728685

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Resonant cavity SiGe/Si MQW heterojunction phototransistor grown on the SIMOX substrate for 1.3 /spl mu/m operation

Qinqing Yang, Yuqing Zhu, Qiming Wang
1997 | 10.1109/ECTC.1997.606328

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Miniaturized two stage aerosol impactor with chip-scale stages for airborne particulate size separation

J C Wilson, Siavash Pourkamali, M Maldonadogarcia, V Kumar
2015

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Low-viscosity and fast-curing polymer system for UV-based nanoimprint lithography and its processing

Ulrich Plachetka, Sabine Wiedenberg, Marko Vogler, Andreas Fuchs, Heinrich Kurz, Markus Bender, Gabi Grutzner, F Reuther
2007 | 10.1117/12.708507

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British Standard On Surface Flaws

Proceedings of SPIE | 1989 | 10.1117/12.962821

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Straddle gate transistors: high I/sub on//I/sub off/ transistors at short gate lengths

S N Tiwari, Stanley Cohen, A Kumar, Jeffrey J Welser
1999 | 10.1109/DRC.1999.806311

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