Papers

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Surface micro-machined polysilicon probes for neurophysiology

Jit Muthuswamy, J D Mcbrayer, Nitish V Thakor, Murat Okandan
2000 | 10.1109/IEMBS.2000.900722

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An integrated fully-differential CMOS-MEMS z-axis accelerometer utilizing a torsional suspension

Hongwei Qu, Deyou Fang, Huikai Xie
2008 | 10.1109/NEMS.2008.4484502

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Analysis of squeeze-film air damping of thick perforated plate in MEMS device

Xiong Wang, Zelong Zhou
2011 | 10.1109/NEMS.2011.6017312

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Equipment modeling for plasma etch process using artificial neural network

Arit Thammano
1998 | 10.1109/APCCAS.1998.743907

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Enhancement of colored engravings

Vladimir Misic, Robert R Buckley, Kevin J Parker
2002 | 10.1109/ICME.2002.1035885

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Electrical characteristics of silicon nanowire transistor fabricated by AFM lithography

Sabar D Hutagalung, Kam C Lew
2010 | 10.1109/SMELEC.2010.5549507

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Application of sodium hydroxide in analysis of gate oxide issue of leakage failures

K F Lo, A Oo, Z G Song, S P Neo, C K Oh
2004 | 10.1109/SMELEC.2004.1620871

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Preparation of superhydrophobic surface for PTFE/ePTFE materials by oxygen plasma treatment

Chounglii Chao, Hsihsin Chien, Yunpeng Yeh, Kungjeng Ma
2011 | 10.1109/EMEIT.2011.6023312

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Effects of oxygen content, backside damage and polysilicon backsealed substrate on switching transistors and diodes

Amir Raslan Yahya, Jina Schumate, Herngder Chiou
1996 | 10.1109/SMELEC.1996.616463

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Deposition and etching of diaphragm and sacrificial layer in novel MEMS capacitive microphone structure

Bahram Azizollah Ganji, Burhanuddin Yeop Majlis
2008 | 10.1109/SMELEC.2008.4770314

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Characterization of etched tracks and nanotubules by ion transmission spectrometry

D Fink, A S Berdinsky, N Stolterfoht, L T Chadderton, V Hnatowicz, Jiri Vacik, A Petrov, M Muller, J Cervena
2002 | 10.1109/SREDM.2002.1024302

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Compact polarization-insensitive biopolymer multimode interference waveguide splitter

Jun Zhou, Z Y Wang, E Y B Pun
Applied Physics Letters | 2009 | 10.1063/1.3271680

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Influence of process pressure on the growth of hydrocarbon films under direct dc bias in an electron cyclotron resonance plasma

Qichun Zhang, Rusli, H Yang, Wei L New, S F Yoon, Jinho Ahn, Yi Sun Wu
Journal of Applied Physics | 1998 | 10.1063/1.368815

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On the constant composition and thickness of the chlorinated silicon surface layer subjected to increasing etching product concentrations during chlorine plasma etching

K H A Bogart, Vincent M Donnelly
Journal of Applied Physics | 1999 | 10.1063/1.370975

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Surface-micromachined chain for use in microelectromechanical structures

Vernon Sr George E
2001

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Parallel computing for sheet metal strain analysis

Haul Chan, Allan D Spence, M P Sklad
2005 | 10.1109/HPCS.2005.39

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High-transmittance surface textures formed by plasma etching of metallophthalocyanine films

Hajime Sakata
Journal of Applied Physics | 2001 | 10.1063/1.1371950

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Damascene copper integration

Anthony K Stamper, John E Heidenreich, D C Hubanks, Thomas L Mcdevitt, S L Luce
1999 | 10.1109/PPID.1999.798841

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Fabrication of comb-shaped microactuator for multi-degrees-of-freedom system

Futoshi Fujikawa, Hirozumi Ishibashi, Kouhei Ohnishi
European Journal of Protistology | 1992 | 10.1109/IECON.1992.254477

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Features design and manufacturing technology in microelectromechanical encapsulated devices

O M Britkov, N Korobova, A V Mikheev, S P Timoshenkov, S S Shepelev
2015 | 10.1117/12.2180923

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