Effect of the rinse solution to avoid 193-nm resist line collapse: a study for modification of resist polymer and process conditions

Seiya Masuda , Masakazu Kobayashi , Woo-kyu Kim , Clement Anyadiegwu, Munirathna Padmanaban , Ralph R. Dammel , Keiichi Tanaka , Yoshiaki Yamada

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/paper/doi/10.1117/12.537409	0.000000	0.000000
INIT	0.002321	0.002321
_initView	0.008564	0.010885
_initViewBasic	0.000993	0.011878
_initSiteModules	0.001690	0.013568
_initRouters	0.001794	0.015362
pre dispatch _	0.013950	0.029312
LC::doiAction START	0.000248	0.029560
LC::doiAction END to showListing	0.269199	0.298759
LC::showListing START	0.000009	0.298768
LC::showListing get reviews START	0.004550	0.303318
ES Review Search START	0.008174	0.311492
ES Review Search END	0.004680	0.316172
LC::showListing get reviews END	0.000046	0.316218
Done	0.035066	0.351284