Effect of the rinse solution to avoid 193-nm resist line collapse: a study for modification of resist polymer and process conditions

Seiya Masuda, Masakazu Kobayashi, Woo-Kyu Kim, Clement Anyadiegwu, Munirathna Padmanaban, Ralph R. Dammel, Keiichi Tanaka, Yoshiaki Yamada

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DOI 10.1117/12.537409

Journal Advances in Resist Technology and Processing XXI
Location 2004
Publication Type proceedings-article

Tags design rules, polymers, optical resolution, matrices, aspect ratio, electrons, manufacturing, water
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