Effect of the rinse solution to avoid 193-nm resist line collapse: a study for modification of resist polymer and process conditions

Seiya Masuda , Masakazu Kobayashi , Woo-kyu Kim , Clement Anyadiegwu, Munirathna Padmanaban , Ralph R. Dammel , Keiichi Tanaka , Yoshiaki Yamada

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/paper/doi/10.1117/12.537409	0.000000	0.000000
INIT	0.001807	0.001807
_initView	0.006168	0.007975
_initViewBasic	0.000682	0.008657
_initSiteModules	0.001161	0.009818
_initRouters	0.001171	0.010989
pre dispatch _	0.010198	0.021187
LC::doiAction START	0.000197	0.021384
LC::doiAction END to showListing	0.255021	0.276405
LC::showListing START	0.000009	0.276414
LC::showListing get reviews START	0.002649	0.279063
ES Review Search START	0.004994	0.284057
ES Review Search END	0.004328	0.288385
LC::showListing get reviews END	0.000031	0.288416
Done	0.021855	0.310271