New spin-on metal hardmask materials for lithography processes

Huirong Yao , Salem Mullen , Elizabeth Wolfer , Dalil Rahman , Clement Anyadiegwu, Douglas Mckenzie , Alberto Dioses , Joonyeon Cho , Munirathna Padmanaban

Paper Rating

Paper Details

/paper/doi/10.1117/12.2011226	0.000000	0.000000
INIT	0.004836	0.004836
_initView	0.008469	0.013305
_initViewBasic	0.000957	0.014262
_initSiteModules	0.001512	0.015774
_initRouters	0.001543	0.017317
pre dispatch _	0.013783	0.031100
LC::doiAction START	0.000181	0.031281
LC::doiAction END to showListing	0.265803	0.297084
LC::showListing START	0.000005	0.297089
LC::showListing get reviews START	0.003333	0.300422
ES Review Search START	0.006006	0.306428
ES Review Search END	0.006549	0.312977
LC::showListing get reviews END	0.000029	0.313006
Done	0.026218	0.339224