Thermal stability and energy-band alignment of nitrogen-incorporated Zr O 2 films on Si(100)

Q Fang , G H Li , L D Zhang , L Q Zhu , Meiyun Liu , Gaohong He

Paper Rating

Paper Details

/paper/doi/10.1063/1.2209882	0.000000	0.000000
INIT	0.002726	0.002726
_initView	0.012133	0.014859
_initViewBasic	0.003028	0.017887
_initSiteModules	0.004255	0.022142
_initRouters	0.002720	0.024862
pre dispatch _	0.019367	0.044229
LC::doiAction START	0.000294	0.044523
LC::doiAction END to showListing	0.235072	0.279595
LC::showListing START	0.000004	0.279599
LC::showListing get reviews START	0.004672	0.284271
ES Review Search START	0.009478	0.293749
ES Review Search END	0.005447	0.299196
LC::showListing get reviews END	0.000070	0.299266
Done	0.017476	0.316742